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Etching Gases

SK specialty leads the global etching gas market based on its advanced technological standards.

SK specialty

Among the etching gases, we produce and sell trifluoromethane (CHF3), hexafluoroethane (C2F6), carbon tetrafluoride (CF4), octafluorocyclobutane (C4F8), pentafluoroethane (C2HF5), etc., which has precise etching ability, and will continuously provide various etching solutions.

CH3F(모노플루오르메탄), C4F6(육불화부타디엔), CH2F2(디플루오르메탄), CHF3(트리플루오르메탄), ETC(기타) Dry Etching(->) 식각 공정 전 -> 식각 공정 후

The etching process of semiconductors and displays is a process of removing the rest except for the required circuit patterns, and the etching gas is used for precision etching to refine the line width of the semiconductor and to implement micro-circuit patterns required for high-resolution displays.

  • TrifluoromethaneCHF3

    CHF3 is used for etching in the manufacturing process of the display panel.

  • Hexafluorobutadiene C2F6

    It is used for semiconductor fine pattern etching.

  • Carbon tetrafluoride CF4

    It is used for oxide film etching.

  • Octafluorocyclobutane C4F8

    It provides a high selection ratio for the mask and is used for 3D NAND high aspect ratio etching.

  • Pentafluoroethane C2HF5

    It is used for etching oxide film and nitride film.

We steadily supply high-quality etching gas to the domestic semiconductor market by securing advanced technologies and sourcing products through collaboration with Showa Denko in Japan.
We will lead the etching gas market by preemptively responding to customers' needs and through constant research and development.