Deposition Gases
SK specialty manufactures and sells various deposition gases used in the manufacturing of semiconductors
and display panels through continuous research and active, strategic marketing.
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Tungsten
hexafluoride WF6더보기Global No. 1 WF6 is used in patterning semiconductor to form metal contacts and gates.
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MonosilaneSiH4더보기
Korea’s first and only manufacturer and seller of monosilane (SiH4) SiH4 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
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DisilaneSi2H6더보기
Si2H6 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
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DichlorosilaneSiH2Cl2더보기
SiH2Cl2is a gas used for nitride(SixNy) deposition.
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MonochlorosilaneSiH3Cl더보기
SiH3Cl is a precursor material used in the manufacturing of semiconductors and display panels.
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Trimethylsilane
(3MS, SiH(CH3)3)더보기
It is a deposition gas for the formation of an interlayer planarization insulating film (SiO2) between semiconductor metal lines and the gap filling process.
- Tungsten hexafluoride
WF6 - Global No. 1 WF6 is used in patterning semiconductor to form metal contacts and gates.
- Monosilane
SiH4 - Korea’s first and only manufacturer and seller of monosilane (SiH4) SiH4 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
- Disilane
Si2H6 - Si2H6 is used during the manufacturing process of semiconductor, display and PV, where it is employed for Si insulator film and Si anti-reflection layer deposition.
- Dichlorosilane
SiH2Cl2 - SiH2Cl2 is a gas used for nitride(SixNy) deposition.
- Monochlorosilane
SiH3Cl - SiH3Cl is a precursor material used in the manufacturing of semiconductors and display panels.
- Trimethylsilane (3MS, SiH(CH3)3)
- It is a deposition gas for the formation of an interlayer planarization insulating film (SiO2) between semiconductor metal lines and the gap filling process.
