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Cleaning Gases

Global No. 1, Production of Nitrogen Trifluoride for the First in Korea and the Best in the World Since successfully localizing the production of NF3(Nitrogen trifluoride) for the first time in Korea In 2001,
we have been providing the highest quality Nitrogen trifluoride stably to clients through independent
technology development and preemptive expansion investment.

SK specialty Global NO.1

Nitrogen trifluoride (NF3)

NF3 is used during the manufacturing process of semiconductor, display and PV,
as it removes residues from inner wall of the chamber after CVD manufacturing process.

  • ISO CONTAINER
  • Y-CYLINDER
  • BUNDLE
  • INDIVIDUAL

SPECIFICATION

Unit : ppmv
SPECIFICATION : NF3, O2+Ar, N2, CF4, CO, CO2, N2O, SF6, HF, H2O
NF3 O2+Ar N2 CF4 CO CO2 N2O SF6 HF H2O
99.999% 1.0 1.0 10.0 1.0 1.0 1.0 1.0 1.0 1.0
SPECIFICATION : NF3, SPECIFICATIO
NF3 99.999%
O2+Ar 1.0
N2 1.0
CF4 10.0
CO 1.0
CO2 1.0
N2O 1.0
SF6 1.0
HF 1.0
H2O 1.0

CYLINDERS INFORMATION

CYLINDERS INFORMATION : TYPE, MATERIAL, FILLING WEIGHT, VALVE CONNECTION TYPE
TYPE MATERIAL FILLING WEIGHT VALVE CONNECTION TYPE
47L Mn Steel 15 / 20 / 22.7 kg CGA/DISS640, CGA330,
JIS-22-14R/L etc.
Bundle Customized
Y-CYLINDER Cr-Mo Steel 195 / 200 kg CGA/DISS640 etc.
ISO Container 20ft 4,200 kg
40ft 8,000 kg
CYLINDERS INFORMATION : 47L, SPECIFICATIO
TYPE 47L
MATERIAL Mn Steel
FILLING WEIGHT 15 / 20 / 22.7 kg
VALVE CONNECTION TYPE CGA/DISS640, CGA 330, JIS-22-14R/L etc.
CYLINDERS INFORMATION : Bundle, SPECIFICATIO
TYPE Bundle
MATERIAL Mn Steel
FILLING WEIGHT Customized
VALVE CONNECTION TYPE CGA/DISS640, CGA 330, JIS-22-14R/L etc.
CYLINDERS INFORMATION : Y-CYLINDER, SPECIFICATIO
TYPE Y-CYLINDER
MATERIAL Cr-Mo Steel
FILLING WEIGHT 195 / 200 kg
VALVE CONNECTION TYPE CGA/DISS640 etc.
CYLINDERS INFORMATION : ISO Container, SPECIFICATIO
TYPE ISO Container
MATERIAL Cr-Mo Steel
FILLING WEIGHT 20ft 4,200 kg
40ft 8,000 kg
VALVE CONNECTION TYPE CGA/DISS640 etc.
Purpose of use - Wafer, Glass → Substrate In (Wafer, Chamber, Heater) → Processing (Process gases) Zoom In - Semiconductor (Dielectric), Display (Passivation) → Substrate Out (It is used when forming Si insulating films and Si anti-reflection coating.) → Cleaning (NF3 - NF3 is used during the manufacturing process of semiconductor, display and PV, as it removes residues from inner wall of the chamber after CVD manufacturing process.) → Semiconductor (Wafer), Display (Glass)