Others

SiH3Cl (Mono Chlorosilane)

SiH3Cl(MCS)is a precursor material used in the manufacturing of semiconductors and display.

SPECIFICATION

Unit : %
SiH3Cl SiH2Cl2 SiH4 N2
98% 0.03 2 0.1

CYLINDER INFORMATION

 
CYLINDER INFORMATION MATERIAL VALVE CONNECTION TYPE FILLING WEIGHT
Individual Cylinder Mn Steel, Cr-Mo Steel CGA/DISS636 26

He (Helium)

Helium is an inert gas used widely across the industry s as a carrier gas, purge gas, cooling gas, tracer gas for leak detection, or entertaining gas.

Unit : ppm
Purity O2 H2O N2 THC CO CO2 Ne Ar
≥ 99.9995 % < 1.0 < 0.5 < 1.0 < 0.1 < 0.1 < 0.1 < 0.5 < 0.5
He SPECIFICATIO
Purity He ≥ 99.9995 %
Impurity
(ppm)		 O2 < 1.0
H2O < 0.5
N2 < 1.0
THC < 0.1
CO < 0.1
CO2 < 0.1
Ne < 0.5
Ar < 0.5

SiCl4 (Silicon Tetrachloride)

SiCl4 is a gas which may be used with Si powder in the manufacturing of polysilicon wafers. It may be also used for deposition and etching during semiconductor fabrication.

Unit : ppm
Purity N2 O2 CO2 HCI
≥ 99.9999 % < 1.0 < 1.0 < 1.0 < 1.0
Unit : ppb
Na Fe Ni Mn Cr Cu Zn Al Ca Co
< 1.0 < 4.0 < 4.0 < 1.0 < 1.0 < 5.0 < 1.0 < 5.0 < 2.0 < 8.0
Unit : ppm, ppb
SiCl4 SPECIFICATIO
Purity SiCl4 ≥ 99.9999 %
Impurity
(ppm)		 N2 < 1.0
O2 < 1.0
CO2 < 1.0
HCI < 0.1
Impurity
(ppb)		 Na < 1.0
Fe < 4.0
Ni < 4.0
Mn < 1.0
Cr < 1.0
Cu < 5.0
Zn < 1.0
Al < 5.0
Ca < 2.0
Co < 8.0

Xe (Xenon)

Xenon is an inert, colorless, and odorless gas that may be acquired from air separation.
It could be mixed with other gases to produce lasers for display panels, semiconductors, and medical purposes.
The gas has steadily increased to be applied to various areas for diverse uses.

Unit : ppm
Purity Kr O2 N2 CO2 CH4 CF4 C2F6 SF6 NO2 H2O
≥ 99.9999 % < 1.0 < 1.0 < 1.0 < 1.0 < 1.0 < 1.0 < 1.0 < 1.0 < 1.0 < 1.0
Xe SPECIFICATIO
Purity Xe ≥ 99.9999 %
Impurity
(ppm)		 Kr < 1.0
O2 < 1.0
N2 < 1.0
CO2 < 1.0
CH4 < 1.0
CF4 < 1.0
C2F6 < 1.0
SF6 < 1.0
NO2 < 1.0
H2O < 1.0